Analysis of a model for imaging in photolithography

DOI10.1016/0022-247X(89)90372-7zbMath0694.35209MaRDI QIDQ909139

H. P. Urbach

Publication date: 1989

Published in: Journal of Mathematical Analysis and Applications (Search for Journal in Brave)

zbMATH Keywords

limiting absorption principlecontraction mapping theoremphotolithographytime dependent Maxwell equation

Mathematics Subject Classification ID

Nonlinear parabolic equations (35K55) Partial differential equations of mathematical physics and other areas of application (35Q99)

Cites Work

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• Scattering theory for diffraction gratings
• Spectral analysis of strongly propagative systems.
• The principle of limiting absorption
• Equivalent Norms for Sobolev Spaces

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