A low-diffusion flux-splitting scheme for Navier-Stokes calculations
A family of low-diffusion flux-splitting schemes is presented. The schemes can be used for simulations of non-reacting and reacting gas flows. The author claims that the growth of shear layers can be captured with the same accuray as that of the Liou-Steffen scheme, and strong shocks with that of the van Leer-Hänel scheme. Altogether three variants of the scheme are analysed. The results show that the new schemes can provide enhanced robustness and accuracy in situations where conventional approximate Riemann solvers may fail. This behavior, in addition to simplicity, is also claimed for the simulation of reacting gas flows. The papers shows in detail the behavior of the scheme variants in comparison to other schemes.
scientific article; zbMATH DE number 1083954