A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations
type: Item
instance of: scholarly article
title: A level set approach to a unified model for etching, deposition, and lithography. III: Redeposition, reemission, surface diffusion, and complex simulations
zbMATH Open document ID: 0952.65113
published in: Journal of Computational Physics
publication date: 1998-02-17T00:00:00Z
Mathematics Subject Classification ID: 65Z05
Mathematics Subject Classification ID: 35J65
Mathematics Subject Classification ID: 65M06
Mathematics Subject Classification ID: 65C20
Mathematics Subject Classification ID: 35Q60
Mathematics Subject Classification ID: 78A55
Mathematics Subject Classification ID: 78M20
zbMATH DE Number: 1110133
zbMATH Keywords: level set formulation
zbMATH Keywords: topography simulation
zbMATH Keywords: deposition, etching, and lithography processes
zbMATH Keywords: integrated circuit fabrication
zbMATH Keywords: Hamilton-Jacobi type equation
zbMATH Keywords: propagating level set function
zbMATH Keywords: hyperbolic conservation laws
zbMATH Keywords: redeposition
zbMATH Keywords: reemission
zbMATH Keywords: surface diffusion
zbMATH Keywords: transport equations
zbMATH Keywords: thin film layers
author: David Adalsteinsson
author: James Sethian
MaRDI profile type: Publication
full work available at URL: jcph.1997.5817
OpenAlex ID: W2050946498
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DOI: 10.1006/JCPH.1997.5817
description: scientific article; zbMATH DE number 1110133