A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
type: Item
instance of: scholarly article
title: A level set approach to a unified model for etching, deposition, and lithography. II: Three-dimensional simulations
zbMATH Open document ID: 0840.65131
author: David Adalsteinsson
author: James Sethian
published in: Journal of Computational Physics
publication date: 1996-06-30T00:00:00Z
Mathematics Subject Classification ID: 65Z05
Mathematics Subject Classification ID: 65C20
Mathematics Subject Classification ID: 35Q80
Mathematics Subject Classification ID: 35G10
Mathematics Subject Classification ID: 35K25
Mathematics Subject Classification ID: 65M06
Mathematics Subject Classification ID: 35L65
zbMATH DE Number: 851745
zbMATH Keywords: finite difference method
zbMATH Keywords: level set formulation
zbMATH Keywords: three-dimensional topography simulation
zbMATH Keywords: lithography
zbMATH Keywords: integrated circuit fabrication
zbMATH Keywords: Hamilton-Jacobi-type equation
zbMATH Keywords: hyperbolic conservation laws
zbMATH Keywords: equations of motion
zbMATH Keywords: etching
zbMATH Keywords: visibility
zbMATH Keywords: surface diffusion
zbMATH Keywords: reflection
zbMATH Keywords: algorithms
zbMATH Keywords: deposition
zbMATH Keywords: source flux functions
MaRDI profile type: Publication
full work available at URL: jcph.1995.1221
OpenAlex ID: W2091510311
DOI: 10.1006/JCPH.1995.1221
description: scientific article; zbMATH DE number 851745