Model of PE-CVD apparatus: verification and simulations
type: Item
instance of: scholarly article
title: Model of PE-CVD apparatus: verification and simulations
zbMATH Open document ID: 1425.76219
DOI: 10.1155/2010/407561
author: Yanyan Li
published in: Mathematical Problems in Engineering
publication date: 2010-09-30T00:00:00Z
review text: Summary: We present a simulation of chemical vapor deposition with metallic bipolar plates. In chemical vapor deposition, a delicate optimization between temperature, pressure and plasma power is important to obtain homogeneous deposition. The aim is to reduce the number of real-life experiments in a given CVD plasma reactor. Based on the large physical parameter space, there are a hugh number of possible experiments. A detailed study of the physical experiments in a CVD plasma reactor allows to reduce the problem to an approximate mathematical model, which is the underlying transport-reaction model. Significant regions of the CVD apparatus are approximated and physical parameters are transferred to the mathematical parameters. Such an approximation reduces the mathematical parameter space to a realistic number of numerical experiments. The numerical results are discussed with physical experiments to give a valid model for the assumed growth and we could reduce expensive physical experiments.
Mathematics Subject Classification ID: 76N25
Mathematics Subject Classification ID: 76M25
zbMATH DE Number: 5793746
Wikidata QID: Q58653072
describes a project that uses: UG
MaRDI profile type: Publication
full work available at URL: https://doi.org/10.1155/2010/407561
OpenAlex ID: W1983528462
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description: scientific article; zbMATH DE number 5793746