Optimization of the inlet velocity profile for uniform epitaxial growth in a vertical metalorganic chemical vapor deposition reactor
type: Item
instance of: scholarly article
title: Optimization of the inlet velocity profile for uniform epitaxial growth in a vertical metalorganic chemical vapor deposition reactor
zbMATH Open document ID: 0977.76093
DOI: 10.1016/S0017-9310(99)00085-X
author: Yanyan Li
published in: International Journal of Heat and Mass Transfer
publication date: 2001-02-20T00:00:00Z
Mathematics Subject Classification ID: 76V05
Mathematics Subject Classification ID: 76M30
Mathematics Subject Classification ID: 80A20
zbMATH DE Number: 1436717
zbMATH Keywords: uniform epitaxial growth
zbMATH Keywords: vertical metalorganic chemical vapor deposition reactor
zbMATH Keywords: optimization procedure
zbMATH Keywords: inlet velocity profile
zbMATH Keywords: 6th-degree Chebyshev polynomial
MaRDI profile type: Publication
full work available at URL: s0017-9310(99)00085-x
OpenAlex ID: W2062191400
description: scientific article; zbMATH DE number 1436717