Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process
type: Item
instance of: scholarly article
title: Development of a new simulation model of spin coating process and its application to optimize the 450 mm wafer coating process
zbMATH Open document ID: 1305.76012
author: Jung-Yeul Jung
author: Junemo Koo
author: Yong-Tae Kang
published in: International Journal of Heat and Mass Transfer
publication date: 2010-06-08T00:00:00Z
Mathematics Subject Classification ID: 76A20
zbMATH DE Number: 5718069
zbMATH Keywords: spin coating
zbMATH Keywords: photoresist
zbMATH Keywords: photoresist consumption minimization
zbMATH Keywords: wafer enlargement
MaRDI profile type: Publication
full work available at URL: j.ijheatmasstransfer.2010.01.018
OpenAlex ID: W2004666264
cites work: Flow of a Viscous Liquid on a Rotating Disk
DOI: 10.1016/J.IJHEATMASSTRANSFER.2010.01.018
description: scientific article; zbMATH DE number 5718069