Pages that link to "Item:Q1917106"
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The following pages link to Numerical study of a three-dimensional chemical vapor deposition reactor with detailed chemistry (Q1917106):
Displaying 16 items.
- Multicomponent flow modeling (Q424264) (← links)
- Micro and macro scale technique for strongly coupled two-phase flows simulation (Q435404) (← links)
- Modeling and simulation of a chemical vapor deposition (Q539001) (← links)
- Several aspects of the return flows formation in horizontal CVD reactors (Q1290770) (← links)
- Optimization of a horizontal MOCVD reactor for uniform epitaxial layer growth (Q1579279) (← links)
- Kinetic theory of chemical reactions on crystal surfaces (Q2072284) (← links)
- Thermodynamic and kinetic study of transport and reaction phenomena in gallium nitride epitaxy growth (Q2425921) (← links)
- 3D chemical reactor LB simulations (Q2506929) (← links)
- Thermal diffusion effects in hydrogen-air and methane-air flames (Q4266897) (← links)
- Parallelization strategies for an implicit Newton-based reactive flow solver (Q4649669) (← links)
- The modeling of realistic chemical vapor infiltration/deposition reactors (Q4933233) (← links)
- (Q5192487) (← links)
- (Q5248174) (← links)
- Dissipative Reactive Fluid Models from the Kinetic Theory (Q5255989) (← links)
- The treatment of reacting surfaces for finite-volume schemes on unstructured meshes (Q5956025) (← links)
- A numerically stable method for integration of the multicomponent species diffusion equations (Q5956658) (← links)