Optimization of a horizontal MOCVD reactor for uniform epitaxial layer growth (Q1579279)
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scientific article; zbMATH DE number 1502298
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Optimization of a horizontal MOCVD reactor for uniform epitaxial layer growth |
scientific article; zbMATH DE number 1502298 |
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Optimization of a horizontal MOCVD reactor for uniform epitaxial layer growth (English)
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5 December 2001
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film uniformity
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optimal reactor shape
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reduced basis method
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numerical optimization
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horizontal metal-organic chemical vapor deposition reactor
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sequential linear programming
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Chebyshev polynomials
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SIMPLE-type finite volume method
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non-orthogonal grid
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0.8532146215438843
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0.7196717858314514
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0.7136796712875366
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