Pages that link to "Item:Q941774"
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The following pages link to Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor (Q941774):
Displaying 5 items.
- Kinetic plasma simulations for three dielectric etchers (Q710204) (← links)
- AETHER: A simulation platform for inductively coupled plasma (Q729097) (← links)
- The surface charging effects in three-dimensional simulation of the profiles of plasma-etched nanostructures (Q2889645) (← links)
- 3D electromagnetic simulation of a large diameter cylindrical surface wave excited plasma reactor (Q3602330) (← links)
- ETCH PROFILE EVOLUTION IN LOW PRESSURE RF PLASMA WITH AXIAL MAGNETIC FIELD (Q4835958) (← links)