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Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor - MaRDI portal

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Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor (Q941774)

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scientific article; zbMATH DE number 5319265
Language Label Description Also known as
English
Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor
scientific article; zbMATH DE number 5319265

    Statements

    title
    Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor (English)
    0 references
    author
    Yi-Ran An
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    YiJia Lu
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    DongSan Li
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    Yao-Song Chen
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    publication date
    2 September 2008
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    zbMATH Keywords
    inductively coupled plasma
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    electron density
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    electron temperature
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    power deposition
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    Identifiers

    Mathematics Subject Classification ID
    78A30
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    78M25
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    82C70
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    82D10
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    zbMATH DE Number
    5319265
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    OpenAlex ID
    W2174180641
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