Pages that link to "Item:Q981303"

The following pages link to Modeling two-dimensional diffusion-controlled wet chemical etching using a total concentration approach (Q981303):

Displaying 7 items.

• A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching (Q978152) (← links)
• Total concentration approach for three-dimensional diffusion-controlled wet chemical etching (Q981487) (← links)
• A free-convection boundary-layer model for the centrifugal etching of an axisymmetric cavity (Q1287081) (← links)
• A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole (Q1404099) (← links)
• Mass transport in a partially covered fluid-filled cavity (Q1579278) (← links)
• Modeling and simulation of thermal chlorine etching of gallium arsenide with application to real-time feedback control (Q1609469) (← links)
• (Q3363940) (← links)