Pages that link to "Item:Q5933368"
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The following pages link to Two-dimensional adaptive simulation of dopant diffusion in silicon (Q5933368):
Displaying 7 items.
- Maximum a posteriori estimation of activation energies that control silicon self-diffusion (Q999024) (← links)
- High-order linearly implicit two-step peer - finite element methods for time-dependent PDEs (Q1007384) (← links)
- Simulation of coupled diffusion of impurity atoms and point defects under nonequilibrium conditions in local domain (Q1601555) (← links)
- On an adaptive time stepping strategy for solving nonlinear diffusion equations (Q1803291) (← links)
- Diffusion of Dopant in Crystalline Silicon: An Asymptotic Analysis (Q3030500) (← links)
- AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE (Q3349929) (← links)
- Simulation of the postexposure bake process of chemically amplified resists by reaction-diffusion equations (Q5953236) (← links)