Pages that link to "Item:Q5956645"
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The following pages link to Recent advances in models for thermal oxidation of silicon (Q5956645):
Displaying 11 items.
- Chemically induced swelling of hydrogels (Q597753) (← links)
- Coupling diffusion-reaction-mechanics model for oxidation (Q747066) (← links)
- Oxidation-induced stresses in the isolation oxidation of silicon (Q1577265) (← links)
- Advances in the numerical treatment of grain-boundary migration: coupling with mass transport and mechanics (Q2459254) (← links)
- A simulation system based on mixed-hybrid finite elements for thermal oxidation in semiconductor technology (Q2484843) (← links)
- A numerical strategy for investigating the kinetic response of stimulus-responsive hydrogels (Q2495805) (← links)
- Construction of an Asymptotic Model for the Oxidation Process of Silicon (Q4214706) (← links)
- (Q4441535) (← links)
- On modelling thermal oxidation of Silicon I: theory (Q4493651) (← links)
- On modelling thermal oxidation of Silicon II: numerical aspects (Q4493652) (← links)
- A mixture-compatible theory of chemothermal deposition and expansion in <i>n</i>-constituent finitely deforming composite materials with initially circularly cylindrical microstructures (Q5136827) (← links)