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A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion - MaRDI portal

A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion (Q1388377)

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scientific article; zbMATH DE number 1162351
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English
A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion
scientific article; zbMATH DE number 1162351

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    A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion (English)
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    15 November 1998
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