Molecular dynamics study of diffusion and atomic configuration in layered structures for Al circuit interconnects (Q1970782)
From MaRDI portal
 | This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: Molecular dynamics study of diffusion and atomic configuration in layered structures for Al circuit interconnects |
scientific article; zbMATH DE number 1420482
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Molecular dynamics study of diffusion and atomic configuration in layered structures for Al circuit interconnects |
scientific article; zbMATH DE number 1420482 |
Statements
Molecular dynamics study of diffusion and atomic configuration in layered structures for Al circuit interconnects (English)
0 references
27 July 2000
0 references
Diffusion at Al(1 1 1)/underlay-metal interfaces, which is a dominant factor of electromigration-induced open-circuit failures in Al interconnects, is investigated by molecular dynamics simulation.
0 references
electromigration-induced open-circuit failures in Al interconnects
0 references
molecular dynamics
0 references
