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Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor (Q1972951)

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scientific article; zbMATH DE number 1436716
Language Label Description Also known as
English
Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor
scientific article; zbMATH DE number 1436716

    Statements

    title
    Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor (English)
    0 references
    author
    Il-Kyoung Kim
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    Woo-Seung Kim
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    publication date
    1 February 2001
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    Identifiers

    zbMATH DE Number
    1436716
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    Wikidata QID
    Q126635287
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    OpenAlex ID
    W2068177316
    0 references
     
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