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A robust computational algorithm for inverse photomask synthesis in optical projection lithography - MaRDI portal

A robust computational algorithm for inverse photomask synthesis in optical projection lithography (Q2912286)

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scientific article; zbMATH DE number 6082573
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English
A robust computational algorithm for inverse photomask synthesis in optical projection lithography
scientific article; zbMATH DE number 6082573

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    14 September 2012
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    inverse lithography
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    image synthesis
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    total variation
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    algorithm
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    regularization
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    Chambolle's fast duality projection algorithm
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    A robust computational algorithm for inverse photomask synthesis in optical projection lithography (English)
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