The Behaviour of the Etching Rate in a Model of Plasma Etching (Q4698216)
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scientific article; zbMATH DE number 755090
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | The Behaviour of the Etching Rate in a Model of Plasma Etching |
scientific article; zbMATH DE number 755090 |
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The Behaviour of the Etching Rate in a Model of Plasma Etching (English)
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30 October 1995
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global stability
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bulk atoms
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bombarding particles
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chemical sputtering
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surface film reaction
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etching rate
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stable periodic orbits
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comparison method
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positive invariants
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maximal attractor
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attractor enclosures
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