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Investigation into MIS structures based on graded-band-gap hetero-epitaxial HgCdTe grown by molecular-beam epitaxy using photo-emf and conductivity methods - MaRDI portal

Investigation into MIS structures based on graded-band-gap hetero-epitaxial HgCdTe grown by molecular-beam epitaxy using photo-emf and conductivity methods (Q610237)

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scientific article; zbMATH DE number 5822669
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English
Investigation into MIS structures based on graded-band-gap hetero-epitaxial HgCdTe grown by molecular-beam epitaxy using photo-emf and conductivity methods
scientific article; zbMATH DE number 5822669

    Statements

    Investigation into MIS structures based on graded-band-gap hetero-epitaxial HgCdTe grown by molecular-beam epitaxy using photo-emf and conductivity methods (English)
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    3 December 2010
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    mercury cadmium telluride
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    metal-dielectric-semiconductor structure
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    graded-band-gap layers
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    admittance
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    photo-emf
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