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A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects - MaRDI portal

A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects (Q6558121)

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scientific article; zbMATH DE number 7867726
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English
A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects
scientific article; zbMATH DE number 7867726

    Statements

    A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects (English)
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    18 June 2024
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    multi-phase-field model
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    anisotropic surface diffusion
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    electromigration
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    misorientation difference
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    crystal orientation
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    finite element method
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