A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects (Q6558121)
From MaRDI portal
| This is the item page for this Wikibase entity, intended for internal use and editing purposes. Please use this page instead for the normal view: A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects |
scientific article; zbMATH DE number 7867726
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects |
scientific article; zbMATH DE number 7867726 |
Statements
A multi-phase-field model of void crossing grain boundary under electromigration-induced anisotropic surface diffusion in interconnects (English)
0 references
18 June 2024
0 references
multi-phase-field model
0 references
anisotropic surface diffusion
0 references
electromigration
0 references
misorientation difference
0 references
crystal orientation
0 references
finite element method
0 references