Analysis of a model for imaging in photolithography (Q909139)
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scientific article; zbMATH DE number 4136617
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Analysis of a model for imaging in photolithography |
scientific article; zbMATH DE number 4136617 |
Statements
Analysis of a model for imaging in photolithography (English)
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1989
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time dependent Maxwell equation
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photolithography
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limiting absorption principle
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contraction mapping theorem
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0.7247768640518188
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0.6768050789833069
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0.6683681011199951
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0.6641349792480469
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