Pages that link to "Item:Q539001"
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The following pages link to Modeling and simulation of a chemical vapor deposition (Q539001):
Displaying 13 items.
- Micro and macro scale technique for strongly coupled two-phase flows simulation (Q435404) (← links)
- Adaptive step-size control in simulation of diffusive CVD processes (Q1036452) (← links)
- Arbitrary-pressure chemical vapor deposition modeling using direct simulation Monte Carlo with nonlinear surface chemistry (Q1879617) (← links)
- An efficient parallel iteration method for multiscale analysis of chemical vapor deposition processes (Q1946134) (← links)
- A multiscale domain decomposition approach for chemical vapor deposition (Q1947530) (← links)
- Model of PE-CVD apparatus: verification and simulations (Q1958829) (← links)
- A method for coupling free molecular and continuum regime methods in order to simulate chemical vapor deposition (Q2361798) (← links)
- Fluid flow and transport processes in a large area atmospheric pressure stagnation flow CVD reactor for deposition of thin films (Q2573672) (← links)
- Computational modelling of shaped metal deposition (Q3017976) (← links)
- Diffuse interface method for simulation of the chemical vapor deposition of pyrolytic carbon: Aspects of the mathematical formulation (Q3546225) (← links)
- Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species (Q4447042) (← links)
- (Q5192487) (← links)
- (Q5248174) (← links)