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Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces - MaRDI portal

Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces (Q833964)

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scientific article; zbMATH DE number 5595598
Language Label Description Also known as
English
Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces
scientific article; zbMATH DE number 5595598

    Statements

    Cathode edge displacement by voiding coupled with grain boundary grooving in bamboo like metallic interconnects by surface drift-diffusion under the capillary and electromigration forces (English)
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    14 August 2009
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    computer simulations
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    models of non-equilibrium phenomena
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    surface diffusion
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    surface morphology
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    electromigration
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    grain boundary grooving
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    cathode drift
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