Pages that link to "Item:Q2567349"
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The following pages link to A theory of pad conditioning for chemical-mechanical polishing (Q2567349):
Displaying 4 items.
- A model for chemical-mechanical polishing of a material surface based on contact mechanics (Q597793) (← links)
- Analytical solution for Polish-rate decay in chemical--mechanical polishing (Q718931) (← links)
- Contact mechanics of a dilatant region located at a compressed elastic interface (Q1625325) (← links)
- Stochastic models for pad structure and pad conditioning used in chemical-mechanical polishing (Q2498470) (← links)